| US 7,460,207 B2 | ||
| Exposure apparatus and method for producing device | ||
| Hideo Mizutani, Yokohama (Japan); and Nobutaka Magome, Kumagaya (Japan) | ||
| Assigned to Nikon Corporation, Tokyo (Japan) | ||
| Filed on Jun. 08, 2005, as Appl. No. 11/147,288. | ||
| Application 11/147288 is a continuation of application No. PCT/JP03/015737, filed on Dec. 09, 2003. | ||
| Claims priority of application No. 2002-357960 (JP), filed on Dec. 10, 2002; and application No. 2003-393858 (JP), filed on Nov. 25, 2003. | ||
| Prior Publication US 2005/0264774 A1, Dec. 01, 2005 | ||
| Int. Cl. G03B 27/52 (2006.01); G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—30 [355/53] | 54 Claims |
| 1. An exposure apparatus which exposes a substrate by transferring an image of a pattern through a liquid onto the substrate,
the exposure apparatus comprising:
a projection optical system which projects the image of the pattern onto the substrate; and
a bubble detector which has a light-receiving system to detect a bubble in the liquid between the projection optical system
and the substrate.
|