| US 7,459,614 B2 | ||
| Method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule thereon and method for stimulating the crystallization of biomolecules | ||
| Celestino Padeste, Baden (Switzerland); Christian Kambach, Brugg (Switzerland); Jens Grobrecht, Gebensdorf (Switzerland); and Harun Solak, Brugg (Switzerland) | ||
| Assigned to Paul Scherrer Institut, Villigen PSI (Switzerland) | ||
| Filed on Aug. 12, 2004, as Appl. No. 10/916,472. | ||
| Application 10/916472 is a continuation of application No. PCT/EP03/01221, filed on Feb. 07, 2003. | ||
| Claims priority of application No. 02003534 (EP), filed on Feb. 15, 2002; and application No. 02010730 (EP), filed on May 14, 2002. | ||
| Prior Publication US 2007/0111256 A1, May 17, 2007 | ||
| Int. Cl. C30B 7/00 (2006.01); C30B 19/00 (2006.01); G02B 27/00 (2006.01) | ||
| U.S. Cl. 977—888 [117/58; 117/68; 359/577] | 28 Claims |
| 1. A method for generating an artificially patterned substrate for stimulating crystallization of a biomolecule, comprising:
treating a basic substrate for providing an artificially patterned substrate, wherein said basic substrate has a surface;
arranging a grating at a predetermined distance to said surface and in a plane substantially parallel to said surface, the
grating having a characteristic selected to generate a pattern of linear wells across said surface, wherein the pattern of
linear wells has a gradient with respect to a pattern periodicity along a length and a width of said surface, and wherein
the linear wells intersect;
exposing the substrate through the grating to X-ray radiation to generate a gradiential artificially patterned substrate having
said gradient; and
performing said exposing according to X-ray interference lithography technology.
|