| US 7,459,327 B2 | ||
| Method for manufacturing micro lenses including underlayer film and lens film etching steps | ||
| Seiji Kai, Gifu (Japan); Ryouji Matsui, Gifu (Japan); Tetsuya Yamada, Gifu (Japan); Tsutomu Imai, Gifu (Japan); and Kazuyuki Takegawa, Ichinomiya (Japan) | ||
| Assigned to Sanyo Electric Co., Ltd., Osaka (Japan) | ||
| Appl. No. 10/533,030 PCT Filed Apr. 16, 2004, PCT No. PCT/JP2004/005487 § 371(c)(1), (2), (4) Date Apr. 26, 2005, PCT Pub. No. WO2004/093196, PCT Pub. Date Oct. 28, 2004. |
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| Claims priority of application No. 2003-111976 (JP), filed on Apr. 16, 2003. | ||
| Prior Publication US 2006/0151773 A1, Jul. 13, 2006 | ||
| Int. Cl. H01L 21/00 (2006.01); H01L 31/062 (2006.01) | ||
| U.S. Cl. 438—48 [257/294] | 3 Claims |
| 1. A method of manufacturing micro lenses, the method comprising:
an underlayer film etching step for etching a flat light transmitting underlayer film along a predetermined mask pattern to
form convex regions between adjacent micro lens forming regions;
a lens film laminating step for laminating a light transmitting lens film of a shape reflecting a shape of the underlayer
film on the underlayer film; and
an etching step for forming concave regions in the lens film over the convex regions by applying a resist over the lens film
to flatten the surface of the lens film and applying an etching process under a condition that the lens film is more easily
etched than the resist, wherein
the lens film has a refractive index higher than that of a substance provided in a layer above the lens film.
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