| US 7,459,249 B2 | ||
| Base for photosensitive drum and photosensitive drum | ||
| Takahiro Suzuki, Kodaira (Japan); Kunio Machida, Kodaira (Japan); and Youichi Nishimuro, Kodaira (Japan) | ||
| Assigned to Bridgestone Corporation, Tokyo (Japan) | ||
| Appl. No. 10/557,710 PCT Filed May 20, 2004, PCT No. PCT/JP2004/007204 § 371(c)(1), (2), (4) Date Nov. 22, 2005, PCT Pub. No. WO2004/104709, PCT Pub. Date Dec. 02, 2004. |
||
| Claims priority of application No. 2003-145681 (JP), filed on May 23, 2003. | ||
| Prior Publication US 2007/0071923 A1, Mar. 29, 2007 | ||
| Int. Cl. G03G 5/026 (2006.01) | ||
| U.S. Cl. 430—56 [430/69] | 12 Claims |

| 1. A cylindrical base for a photosensitive drum composed of a conductive resin composition containing a resin base material and a conductive material mainly containing carbon black, on which base a solvent-using photosensitive layer is directly formed, wherein said resin base material mainly contains a mixed resin in which (A) a polyester resin and (B) a polycarbonate resin are blended in a ratio (weight ratio) of (A)/(B)=50/50 to 90/10. |