| US 7,459,183 B2 | ||
| Method of forming low-K interlevel dielectric layers and structures | ||
| Geraud Jean-Michel Dubois, Los Gatos, Calif. (US); James Lupton Hedrick, Pleasanton, Calif. (US); Ho-Cheol Kim, San Jose, Calif. (US); Victor Yee-Way Lee, San Jose, Calif. (US); Teddie Peregrino Magbitang, San Jose, Calif. (US); Robert Dennis Miller, San Jose, Calif. (US); Muthumanickam Sankarapandian, Yorktown Heights, N.Y. (US); Linda Karin Sundberg, Los Gatos, Calif. (US); and Willi Volksen, San Jose, Calif. (US) | ||
| Assigned to International Business Machines Corporation, Armonk, N.Y. (US) | ||
| Filed on Jul. 27, 2005, as Appl. No. 11/190,644. | ||
| Prior Publication US 2007/0023870 A1, Feb. 01, 2007 | ||
| Int. Cl. B05D 3/02 (2006.01); B05D 3/06 (2006.01) | ||
| U.S. Cl. 427—226 | 1 Claim |

| 1. A method, comprising:
forming a precursor layer on a substrate, said precursor layer including a resin, polymeric nano-particles dispersed in said
resin, and a solvent, each said polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached
to said multi-arm core polymer, said multi-arm core polymer immiscible with said resin and said pendent polymers miscible
with said resin;
heating said precursor layer to a first temperature, said first temperature high enough to drive said solvent out of said
precursor layer without decomposing more than about 0.5% said polymeric nano-particles, to form a pre-baked precursor layer;
heating said pre-baked precursor layer to a second temperature, said second temperature high enough to cross-link at least
about 90% of said resin without decomposing more than about 5% of said polymeric nano-particles, thereby converting said pre-baked
precursor layer to a dielectric layer, said second temperature higher than said first temperature;
after said heating said pre-baked precursor layer to a second temperature, forming trenches in said dielectric layer and filling
said trenches with an electrical conductor;
after said filling said trenches with an electrical conductor, heating said dielectric layer to a third temperature, said
third temperature high enough to thermally decompose at least about 99.5% of said polymeric nano-particles into decomposition
products and to drive said decomposition products out of said dielectric layer, thereby creating voids in said dielectric
layer and converting said dielectric layer to a porous dielectric layer, said third temperature higher than said second temperature;
wherein said polymeric nano-particles comprise between about 10% by weight and about 65% by weight of all solids in said composition;
wherein said first temperature is less than about 100° C., said second temperature is less than about 350° C. and said third
temperature is less than about 450° C.;
wherein a thickness of said porous dielectric layer after said heating to said third temperature is within about 2% of a thickness
of said dielectric layer after said heating to said second temperature;
wherein said dielectric layer has a Young's modulus of at least about 3.6 GPa and wherein said porous dielectric layer has
a permittivity of 2.4 or less and a Young's modulus of at least about 0.8 GPa;
wherein said multi-arm core polymer of each said polymeric nano-particle comprises a polystyrene or substituted polystyrene
star molecule having multiple polystyrene branches, each branch terminating in either one of said pendent polymers or a hydroxyl
group;
wherein said pendent polymers are selected from the group consisting of linear poly(alkyleneglycol), poly(alkylene glycol
methacrylate), poly (methyl methacrylate), poly(acrylamide), poly(methacrylamide), poly(hydroxyethyl methacrylate) and combinations
thereof; and
wherein said resin comprises —(SiO2)n-, —(R′SiO3/2)n-, —(R′2SiO)n- or —(R″Si2O3)n-, wherein R′ is selected from the group consisting of an alkyl group having 1 to 3 carbon atoms, an aryl group having 6
to 12 carbon atoms, and a cycloalkyl group having 6 to 12 carbon atoms, and wherein R″ is selected from the group consisting
of an alkylene group having 1 to 2 carbon atoms and a cycloalkylene group having 6 to 12 carbon atoms.
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