| US 6,964,840 C1 (6550th) | ||
| RADIATION-SENSITIVE RESIN COMPOSITION | ||
| Yukio Nishimura, Mie, Japan; Noboru Yamahara, Mie, Japan; Masafumi Yamamoto, Mie, Japan; Toru Kajita, Mie, Japan; Tsutomu Shimokawa, Mie, Japan, and Hiroshi Ito, San Jose, Calif., assignors to JSR Corporation, Chuo-Ku, Tokyo, Japan, and International Business Machines Corporation, Armonk, N.Y. | ||
| Reexamination Request No. 90/008,465, Feb. 1, 2007. | ||
| Reexamination Certificate for Patent 6,964,840, issued Nov. 15, 2005, Appl. No. 867,892, Jun. 16, 2004. | ||
| Continuation of application No. 09/879,894, filed on Jun. 14, 2001, now Pat. No. 6,800,414. | ||
| Claims priority, application Japan, Jun. 16, 2000, 2000-182297; Apr. 6, 2001, 2001-108824 | ||
| Int. Cl. G03F 7/004;7/039 (2006.01) | ||
| U.S. Cl. 430—270.1 |
| AS A RESULT OF REEXAMINATION, IT HAS BEEN DETERMINED THAT: |
| The patentability of claims 2-3 is confirmed. |
| Claim 1 is determined to be patentable as amended. |
| New claims 7-11 are added and determined to be patentable. |
| Claims 4-6 were not reexamined. |
| 1. A radiation-sensitive resin composition comprising: [A.](A) an acid-labile group-containing resin containing a recurring unit of the following formula (1), 1. A radiation-sensitive resin composition comprising:
[A.](A) an acid-labile group-containing resin containing a recurring unit of the following formula (1),
wherein R1 represents a hydrogen atom or a monovalent acid-labile group, X1 represents a linear or branched fluoroalkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluoroalkyl group [hving]having 1-10 carbon atoms, and
a recurring unit represented by the following formula (2), 1. A radiation-sensitive resin composition comprising:
[A.](A) an acid-labile group-containing resin containing a recurring unit of the following formula (1),
wherein R1 represents a hydrogen atom or a monovalent acid-labile group, X1 represents a linear or branched fluoroalkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluoroalkyl group [hving]having 1-10 carbon atoms, and
a recurring unit represented by the following formula (2),
wherein any two of the R3 groups form, in combination and together with the carbon atom with which these groups bond, a divalent alicyclic hydrocarbon group having 4-20 carbon atoms or a derivative thereof, with the remaining R3 group being a linear or branched alkyl group having 1-4 carbon atoms or a monovalent alicyclic hydrocarbon group having 4-20 carbon atoms or derivative thereof, [and]
(B) a photoacid generator, and
(C) a nitrogen-containing organic compound as an acid diffusion controller.
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