| US 7,456,408 B2 | ||
| Illumination system particularly for microlithography | ||
| Hans-Juergen Mann, Oberkochen (Germany); Wolfgang Singer, Aalen (Germany); Joerg Schultz, Aalen (Germany); Johannes Wangler, Koenigsbronn (Germany); Karl-Heinz Schuster, Koenigsbronn (Germany); Udo Dinger, Oberkochen (Germany); Martin Antoni, Aalen (Germany); and Wilhelm Ulrich, Aalen (Germany) | ||
| Assigned to Carl Zeiss SMT AG, Oberkochen (Germany) | ||
| Filed on Jan. 23, 2008, as Appl. No. 12/9,984. | ||
| Application 12/009984 is a continuation of application No. 11/649199, filed on Jan. 03, 2007, granted, now 7,348,565. | ||
| Application 11/649199 is a continuation of application No. 10/919583, filed on Aug. 17, 2004, granted, now 7,186,983. | ||
| Application 10/919583 is a continuation in part of application No. PCT/EP03/00485, filed on Jan. 20, 2003. | ||
| Application PCT/EP03/00485 is a continuation in part of application No. 10/201652, filed on Jul. 22, 2002, granted, now 6,859,328. | ||
| Application PCT/EP03/00485 is a continuation in part of application No. 10/201652, filed on Jul. 22, 2002, granted, now 6,859,328. | ||
| Application 10/201652 is a continuation in part of application No. 10/150650, filed on May 17, 2002, granted, now 7,006,595. | ||
| Application 10/150650 is a continuation in part of application No. 09/679718, filed on Sep. 29, 2000, granted, now 6,438,199. | ||
| Application 10/150650 is a continuation in part of application No. 09/679718, filed on Sep. 29, 2000, granted, now 6,438,199. | ||
| Application 09/679718 is a continuation in part of application No. 09/305017, filed on May 04, 1999, granted, now 6,198,793. | ||
| Claims priority of application No. 198 19 898 (DE), filed on May 05, 1998; application No. 199 03 807 (DE), filed on Feb. 02, 1999; application No. 299 02 108 U (DE), filed on Feb. 08, 1999; and application No. PCT/EP00/07258 (WO), filed on Jul. 28, 2000. | ||
| Prior Publication US 2008/0130076 A1, Jun. 05, 2008 | ||
| Int. Cl. G02B 27/14 (2006.01); G02B 5/30 (2006.01); G02B 17/00 (2006.01) | ||
| U.S. Cl. 250—365 [250/372; 250/461.1; 250/504 R; 250/492.1; 250/492.2; 250/492.22] | 14 Claims |
| 1. An illumination system for microlithography comprising:
an optical element having a plurality of field raster elements;
a plane in which a field is illuminated; and
a grazing incidence mirror situated in a light path from said optical element to said plane, after said optical element,
wherein said illumination system has no other grazing incidence mirror in said light path, after said optical element and
before said plane.
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