US 7,456,141 B2
	Photo resist stripper composition
Ming-Ann Hsu, Taoyuan (Taiwan); Kuang-Lung Kuo, Taoyuan (Taiwan); Mu-Lin Tsai, Taoyuan (Taiwan); and Sing-Ru Dai, Taoyuan (Taiwan)
Assigned to Echem Solutions Corp., (Taiwan)
Filed on Apr. 19, 2005, as Appl. No. 11/109,406.
Claims priority of application No. 93134044 A (TW), filed on Nov. 05, 2004.
Prior Publication US 2006/0100116 A1, May 11, 2006
Int. Cl. C11D 7/50 (2006.01)

U.S. Cl. 510—175  [510/176; 510/407; 510/506]

2 Claims

1. A photo resist stripper composition consists of propylene glycol mono-methyl ether (PGME) and cyclohexanone (ANONE), wherein the preferred mix ratio by % weight between ANONE and PGME is 30%: 70%, the photo resist stripper is applied as an edge bear remover (EBR) for substrate, a coater cup rinse, and a tube cleaner in equipment, and the substrate consists of that of Si wafer, glass, metal film on glass, SiOx film on glass, SiNx film on glass and Si film on glass.