US 7,452,908 B2
Amide derivatives
Yufu Sagara, Tsukuba (Japan); Minaho Uchiyama, Tsukuba (Japan); Akira Naya, Tsukuba (Japan); Toshifumi Kimura, Tsukuba (Japan); Tomoshige Numazawa, Tsukuba (Japan); Toru Fujikawa, Tsukuba (Japan); Norikazu Otake, Tsukuba (Japan); and Kazuhito Noguchi, Tsukuba (Japan)
Assigned to Banyu Pharmaceutical Co., Ltd., Tokyo (Japan)
Filed on May 05, 2004, as Appl. No. 10/838,340.
Application 10/838340 is a division of application No. 10/031716, granted, now 6,809,108, previously published as PCT/JP00/04762, filed on Jul. 14, 2000.
Claims priority of application No. 99/209292 (JP), filed on Jul. 23, 1999; and application No. 99/338617 (JP), filed on Nov. 29, 1999.
Prior Publication US 2004/0204369 A1, Oct. 14, 2004
This patent is subject to a terminal disclaimer.
Int. Cl. A61K 31/445 (2006.01); C07D 211/32 (2006.01)
U.S. Cl. 514—331  [546/234] 14 Claims
 
1. Compounds which are represented by the following general formula (I)

OG Complex Work Unit Drawing
in which A stands for a group of the following formula (b0)

OG Complex Work Unit Drawing
Ar1, Ar2 and Ar3 each independently stands for optionally substituted phenyl, the substituent being selected from the group consisting of halogen, hydroxyl, lower alkyl, lower alkenyl, lower alkoxy, carbamoyl, lower alkylcarbamoyl and di-lower alkylcarbamoyl; k means 0 or 1; m, n and s each independently means 0, 1 or 2; R1 stands for hydrogen or optionally substituted lower alkyl, the substituent being selected from the group consisting of hydroxyl, amino, carbamoyl, lower alkylcarbamoyl, di-lower alkylcarbamoyl and imidazolyl; R2, R3, R4 and R5 each independently stands for hydrogen or optionally substituted lower alkyl, the substituent being selected from the group consisting of hydroxyl, amino, carbamoyl, lower alkylcarbamoyl, di-lower alkylcarbamoyl and imidazolyl, or R2 and R3, or R4 and R5, may together stand for, independently of each other, optionally substituted trimethylene, the substituent being selected from the group consisting of oxo, hydroxyl, amino, lower alkoxy, lower alkanoyloxy, lower alkylamino, di-lower alkylamino, (imino-lower alkyl)amino, lower alkanoylamino, lower alkoxycarbonylamino, (lower alkylcarbamoyl)amino, lower alkylsulfonylamino, guanidino, lower alkoxycarbonyl, carbamoyl, lower alkylcarbamoyl, di-lower alkylcarbamoyl, imidazolyl and a group represented by —R7, R7 standing for optionally substituted lower alkyl, the substituent being selected from the group consisting of hydroxyl, amino, carbamoyl, lower alkylcarbamoyl, di-lower alkylcarbamoyl, lower alkoxycarbonyl and imidazolyl; R61 and R71 each independently stands for C1-C10 alkyl, lower alkenyl, cycloalkyl, cycloalkyl-lower alkyl whose ring portion may be substituted with lower alkyl, cycloalkenyl-lower alkyl or aralkyl, X stands for carbonyl or methylene; Y stands for nitrogen or methine; and Q stands for anion or salts thereof.