| US 7,452,408 B2 | ||
| System and method for producing bubble free liquids for nanometer scale semiconductor processing | ||
| Jeffrey J. Farber, Delmar, N.Y. (US); and Carl Woods, Aptos, Calif. (US) | ||
| Assigned to Lam Research Corporation, Fremont, Calif. (US) | ||
| Filed on Jun. 30, 2005, as Appl. No. 11/173,132. | ||
| Prior Publication US 2007/0000387 A1, Jan. 04, 2007 | ||
| Int. Cl. B01D 19/00 (2006.01) | ||
| U.S. Cl. 95—260 [95/241; 96/205; 96/155; 96/206] | 23 Claims |
| 1. A system for producing bubble free liquid comprising:
a continuous liquid source; and
a de-bubbling chamber including:
an inlet coupled to an outlet of the continuous liquid source by a supply pipe;
an outlet; and
at least one port in a sidewall of the de-bubbling chamber, the at least
one port being at least a length L from the inlet of the de-bubbling chamber.
|