US 11,817,309 B2
Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid
Yasuyuki Shirai, Sendai (JP); Takeshi Sakai, Sendai (JP); and Takayuki Jizaimaru, Atsugi (JP)
Assigned to TOHOKU UNIVERSITY, Sendai (JP); and NOMURA MICRO SCIENCE CO., LTD., Atsugi (JP)
Filed by TOHOKU UNIVERSITY, Sendai (JP); and NOMURA MICRO SCIENCE CO., LTD., Atsugi (JP)
Filed on Oct. 23, 2020, as Appl. No. 17/078,169.
Application 17/078,169 is a continuation of application No. PCT/JP2019/017986, filed on Apr. 26, 2019.
Claims priority of application No. 2018-088715 (JP), filed on May 2, 2018.
Prior Publication US 2021/0043440 A1, Feb. 11, 2021
Int. Cl. H01L 21/302 (2006.01); H01L 21/02 (2006.01); B08B 3/10 (2006.01); B08B 3/08 (2006.01); C02F 1/68 (2023.01); C11D 3/04 (2006.01); C11D 11/00 (2006.01); G03F 7/42 (2006.01); C11D 3/39 (2006.01); B01F 23/80 (2022.01); B01F 23/23 (2022.01); B01F 23/237 (2022.01); B01F 101/48 (2022.01); B01F 101/00 (2022.01)
CPC H01L 21/02057 (2013.01) [B01F 23/2319 (2022.01); B01F 23/811 (2022.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); C02F 1/68 (2013.01); C11D 3/04 (2013.01); C11D 3/3947 (2013.01); C11D 11/0047 (2013.01); G03F 7/423 (2013.01); B01F 23/237613 (2022.01); B01F 2101/4505 (2022.01); B01F 2101/48 (2022.01); B01F 2215/044 (2013.01); B08B 2203/005 (2013.01); B08B 2203/007 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of producing heated ozone water obtained by dissolving ozone in pure water, the method comprising:
adjusting a pH of the pure water to 3 or less by adding citric acid to the pure water, to obtain an acid water;
dissolving an ozone gas in the acid water to obtain an ozone water; and
heating the pure water, the acid water or the ozone water, to 60° C. or more.