US 11,817,290 B2
Method, device and system for reducing off-axial aberration in electron microscopy
Maarten Bischoff, Uden (NL); Peter Christiaan Tiemeijer, Eindhoven (NL); Tjerk Gerrit Spanjer, Eindhoven (NL); and Stan Johan Pieter Konings, Breda (NL)
Assigned to FEI Company, Hillsboro, OR (US)
Filed by FEI Company, Hillsboro, OR (US)
Filed on Jan. 25, 2023, as Appl. No. 18/159,261.
Application 18/159,261 is a continuation of application No. 17/253,097, granted, now 11,587,759, previously published as PCT/US2018/066790, filed on Dec. 20, 2018.
Claims priority of application No. 17210806 (EP), filed on Dec. 28, 2017.
Prior Publication US 2023/0223231 A1, Jul. 13, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/153 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/153 (2013.01) [H01J 37/1478 (2013.01); H01J 37/20 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 2237/1516 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/202 (2013.01); H01J 2237/221 (2013.01); H01J 2237/2802 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A method for electron microscopy comprising:
providing an electron microscope comprising a sample component, a beam generator, and a beam adjusting component;
securing a sample by using the sample component;
generating an electron beam by using the beam generator;
generating an image beam by directing the electron beam to the sample component; and
adjusting at least one of the electron beam and the image beam in such a way that off-axial aberrations inflicted on at least one of the electron beam and the image beam are minimized, the adjusting performed by using the beam adjusting component to obtain at least one modified image beam, wherein the adjusting comprises applying both shifting and tilting to at least one of the electron beam and the image beam and wherein the amount of tilting of at least one of the electron beam and the image beam depends on the amount of shifting of at least one of the electron beam and the image beam respectively and wherein the amount of tilting is computed based on at least one of coma and astigmatism introduced as a consequence of the shift.