US 11,815,822 B2
Electrodeposition compatible anti-reflection coatings for laser interference lithography applications
Shailesh N. Joshi, Ann Arbor, MI (US); Gaurav Singhal, Champaign, IL (US); Paul Vannest Braun, Champaign, IL (US); Kai-Wei Lan, Champaign, IL (US); and Nenad Miljkovic, Urbana, IL (US)
Assigned to Toyota Motor Engineering & Manufacturing North America, Inc., Plano, TX (US); and The Board of Trustees of the University of Illinois, Urbana, IL (US)
Filed by Toyota Motor Engineering & Manufacturing North America, Inc., Plano, TX (US); and The Board of Trustees of the University of Illinois, Urbana, IL (US)
Filed on Mar. 25, 2022, as Appl. No. 17/704,436.
Prior Publication US 2023/0314965 A1, Oct. 5, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70958 (2013.01) [G03F 7/70316 (2013.01); G03F 7/70408 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A component comprising:
a substrate;
a photoresist layer disposed on the substrate; and
a light diffusing layer sandwiched between the substrate and the photoresist layer, the light diffusing layer comprising an outer metal oxide layer having an outer rough surface configured to diffuse laser light during laser interference lithography of the photoresist layer and reduce to a conductive metallic layer during electroplating of the substrate.