CPC G03F 7/0752 (2013.01) [C09D 4/00 (2013.01); C09D 183/02 (2013.01); C09D 183/04 (2013.01); C09D 183/06 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/02123 (2013.01); H01L 21/311 (2013.01); C08G 77/14 (2013.01)] | 19 Claims |
1. A resist underlayer film-forming composition, the composition being configured such that it can form a film that can be removed with a chemical solution comprising a mixed solution of sulfuric acid and hydrogen peroxide, the composition comprising
a component (A) being an underlayer film-forming polymer, wherein
the component (A) is selected from the group consisting of Formula (A-1), Formula (A-2), Formula (A-3), Formula (A-4), and Formula (A-5):
and
the component (A) has a weight-average molecular weight in the range of from 1,800 to 5,300 g/mol,
a component (B) being an organic cross-linkable compound having a ring structure having an alkoxymethyl group or a hydroxymethyl group, or an organic cross-linkable compound having an epoxy group or a blocked isocyanate group; and
a component (C) that comprises a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof,
wherein the component (C) is selected from the group consisting of Formula (C-1), Formula (C-2), Formula (C-3), Formula (C-4), Formula (C-5), and Formula (C-6):
and
the component (C) has a weight-average molecular weight in the range of from 1,500 to 1,800 g/mol.
|