US 11,815,815 B2
Composition for forming silicon-containing resist underlayer film removable by wet process
Hiroyuki Wakayama, Toyama (JP); Makoto Nakajima, Toyama (JP); Wataru Shibayama, Toyama (JP); and Masahisa Endo, Toyama (JP)
Assigned to NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
Appl. No. 15/522,493
Filed by NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
PCT Filed Nov. 6, 2015, PCT No. PCT/JP2015/081345
§ 371(c)(1), (2) Date Apr. 27, 2017,
PCT Pub. No. WO2016/080217, PCT Pub. Date May 26, 2016.
Claims priority of application No. 2014-234591 (JP), filed on Nov. 19, 2014.
Prior Publication US 2017/0371242 A1, Dec. 28, 2017
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/075 (2006.01); G03F 7/11 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); G03F 7/09 (2006.01); C09D 4/00 (2006.01); C09D 183/04 (2006.01); C09D 183/06 (2006.01); C09D 183/02 (2006.01); C08G 77/14 (2006.01); H01L 21/02 (2006.01); H01L 21/31 (2006.01); G03F 7/20 (2006.01); H01L 21/311 (2006.01)
CPC G03F 7/0752 (2013.01) [C09D 4/00 (2013.01); C09D 183/02 (2013.01); C09D 183/04 (2013.01); C09D 183/06 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/02123 (2013.01); H01L 21/311 (2013.01); C08G 77/14 (2013.01)] 19 Claims
 
1. A resist underlayer film-forming composition, the composition being configured such that it can form a film that can be removed with a chemical solution comprising a mixed solution of sulfuric acid and hydrogen peroxide, the composition comprising
a component (A) being an underlayer film-forming polymer, wherein
the component (A) is selected from the group consisting of Formula (A-1), Formula (A-2), Formula (A-3), Formula (A-4), and Formula (A-5):

OG Complex Work Unit Chemistry
and
the component (A) has a weight-average molecular weight in the range of from 1,800 to 5,300 g/mol,
a component (B) being an organic cross-linkable compound having a ring structure having an alkoxymethyl group or a hydroxymethyl group, or an organic cross-linkable compound having an epoxy group or a blocked isocyanate group; and
a component (C) that comprises a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof,
wherein the component (C) is selected from the group consisting of Formula (C-1), Formula (C-2), Formula (C-3), Formula (C-4), Formula (C-5), and Formula (C-6):

OG Complex Work Unit Chemistry
 and
the component (C) has a weight-average molecular weight in the range of from 1,500 to 1,800 g/mol.