US 11,815,814 B2
Iodized aromatic carboxylic acid type pendant-containing polymer, resist composition and patterning process
Jun Hatakeyama, Joetsu (JP); and Masahiro Fukushima, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Apr. 6, 2021, as Appl. No. 17/223,236.
Claims priority of application No. 2020-079701 (JP), filed on Apr. 28, 2020.
Prior Publication US 2021/0333712 A1, Oct. 28, 2021
Int. Cl. G03F 7/039 (2006.01); G03F 7/038 (2006.01); C08F 220/24 (2006.01); C08F 220/30 (2006.01); C08F 220/28 (2006.01); C08F 212/14 (2006.01); C08F 220/22 (2006.01)
CPC G03F 7/0397 (2013.01) [C08F 212/24 (2020.02); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/303 (2020.02); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01)] 15 Claims
 
1. An iodized aromatic carboxylic acid type pendant-containing polymer comprising recurring units having the formula (A) and recurring units having the formula (B):

OG Complex Work Unit Chemistry
wherein RA is hydrogen or methyl,
RL is hydrogen or an acid labile group,
R1 is a single bond or a C1-C6 alkanediyl group,
X1A is a single bond, phenylene group, naphthalenediyl group or —C(═O)—O—R2—, R2 is a C1-C10 saturated hydrocarbylene group, phenylene group or naphthalenediyl group,
X1B is —O— or —N(R)—, R is hydrogen or a C1-C4 saturated hydrocarbyl group,
m is an integer of 1 to 3, and
k is 1 or 2,

OG Complex Work Unit Chemistry
wherein RA is hydrogen or methyl,
n is 1 or 2,
X2A is a single bond, —O—, —C(═O)—O—, or —C(═O)—NH—,
X2B is a C1-C12 (n+1)-valent saturated hydrocarbon group or (n+1)-valent aromatic hydrocarbon group, wherein some or all of the hydrogen atoms may be substituted by fluorine or hydroxyl, and some carbon may be replaced by an ester bond or ether bond,
R3 is a single bond, ester bond, or C1-C12 saturated hydrocarbylene group wherein some or all of the hydrogen atoms may be substituted by fluorine, and some carbon may be replaced by an ester bond or ether bond, and
R4 is hydrogen, fluorine, methyl, trifluoromethyl, or difluoromethyl, R3 and R4 may bond together to form a ring with the carbon atom to which they are attached, the ring may contain an ether bond, fluorine or trifluoromethyl.