US 11,815,813 B2
Compound, resin, resist composition and method for producing resist pattern
Tatsuro Masuyama, Osaka (JP); Takuya Nakagawa, Osaka (JP); and Koji Ichikawa, Osaka (JP)
Assigned to SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo (JP)
Filed by SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo (JP)
Filed on May 26, 2021, as Appl. No. 17/330,791.
Claims priority of application No. 2020-095362 (JP), filed on Jun. 1, 2020.
Prior Publication US 2021/0389672 A1, Dec. 16, 2021
Int. Cl. G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01)
CPC G03F 7/0392 (2013.01) [G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01)] 13 Claims
 
1. A resist composition comprising,
a resin including a first structural unit derived from a compound represented by formula (I) and a second structural unit represented by formula (a2-A), wherein
a content of the first structural unit is 3 to 50 mol % based on all monomers in the resin, and
a content of the second structural unit is 15 to 50 mol % based on all the monomers in the resin

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
wherein, in formula (I),
R1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom,
L1 represents a single bond or —CO—O—* wherein * represents a bond to the benzene ring,
R3 represents an alkyl group having 1 to 6 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—,
R4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—,
R5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or a first acid-labile group,
m2 represents an integer of 1 to 3,
m3 represents an integer of 1 to 3, and when m3 is 2 or more, a plurality of R3 may be the same or different from each other,
m4 represents an integer of 0 to 2, and when m4 is 2, two R4 may be the same or different from each other, and
m5 represents 1 or 2, and when m5 is 2, two R5 may be the same or different from each other,
in which 3≤m2+m3+m4+m5≤5; and
wherein, in formula (a2-A),
Ra50 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom,
Ra51 represents hydroxy group,
Aa50 represents a single bond or *—Xa51-(Aa52-Xa52)nb—, and * represents a bond to carbon atoms to which —Ra50 is bonded,
Aa52 represents an alkanediyl group having 1 to 6 carbon atoms,
Xa51 and Xa52 each independently represent —O—, —CO—O— or —O—CO—,
nb represents 0 or 1, and
mb represents an integer of 0 to 4, and when mb is an integer of 2 or more, a plurality of Ra51 may be the same or different from each other.
 
13. The resist composition according to claim 1, wherein the resin further includes,
a structural unit represented by formula (a3-4)′:

OG Complex Work Unit Chemistry
La7 represents —O—, *—O-La8-O—, *—O-La8-CO—O—, *—O-La8-CO—O-La9-CO—O— or *—O-La8-O—CO-La9-O— and * represents a bonding site to a carbonyl group,
La8 and La9 each independently represent an alkanediyl group having 1 to 6 carbon atoms,
* represents a bonding site to a carbonyl group,
Ra24 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.