US 11,814,547 B2
Polishing liquid composition for silicon oxide film
Haruhiko Doi, Wakayama (JP); Norihito Yamaguchi, Wakayama (JP); Masato Sugahara, Wakayama (JP); Takanao Seike, Wakayama (JP); and Masaki Inoue, Wakayama (JP)
Assigned to KAO CORPORATION, Tokyo (JP)
Appl. No. 17/280,427
Filed by KAO CORPORATION, Tokyo (JP)
PCT Filed Sep. 18, 2019, PCT No. PCT/JP2019/036554
§ 371(c)(1), (2) Date Mar. 26, 2021,
PCT Pub. No. WO2020/066786, PCT Pub. Date Apr. 2, 2020.
Claims priority of application No. 2018-184736 (JP), filed on Sep. 28, 2018; application No. 2018-184741 (JP), filed on Sep. 28, 2018; application No. 2018-215753 (JP), filed on Nov. 16, 2018; and application No. 2019-127786 (JP), filed on Jul. 9, 2019.
Prior Publication US 2022/0002588 A1, Jan. 6, 2022
Int. Cl. C09G 1/02 (2006.01); H01L 21/3105 (2006.01)
CPC C09G 1/02 (2013.01) [H01L 21/31053 (2013.01)] 16 Claims
 
1. A polishing liquid composition for a silicon oxide film comprising:
cerium oxide particles as component A;
an additive as component B; and
an aqueous medium,
wherein the component B is a compound having a reduction potential of 0.45 V or more when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry, with an Ag/AgCl electrode as a reference,
an oxidation potential of the component B is not detected when a 10 ppm aqueous solution of the component B is measured by cyclic voltammetry with an Ag/AgCl electrode as a reference,
the component B is a reducing compound containing a heteroaromatic ring skeleton, and
a content of the component B is 0.001% by mass or more and 0.1% by mass or less.
 
16. A polishing liquid composition for a silicon oxide film comprising:
cerium oxide particles as component A;
an additive as component B; and
an aqueous medium,
wherein the component B is at least one selected from a component B1, a component B2, or a component B3: the component B1 is a 2-hydroxypyridine N-oxide; the component B2 is an N-oxide compound containing a nitrogen-containing heteroaromatic ring skeleton in which at least one hydrogen atom is substituted with a thiol group, or a salt of the N-oxide compound; and the component B3 is a compound containing a nitrogen-containing heteroaromatic ring skeleton having at least one hydroxyl group and at least one carbonyl group, or a salt of the compound,
the component B is a reducing compound containing a heteroaromatic ring skeleton, and
a content of the component B is 0.001% by mass or more and 0.1% by mass or less.