US 11,814,454 B2
Curable composition, and resin composition for stereolithography prepared therefrom
Kenji Suzuki, Niigata (JP); Yuki Nishijima, Niigata (JP); Daiki Noguchi, Niigata (JP); and Takashi Fukumoto, Niigata (JP)
Assigned to KURARAY CO., LTD., Okayama (JP)
Appl. No. 17/622,926
Filed by KURARAY CO., LTD., Okayama (JP)
PCT Filed Jun. 25, 2020, PCT No. PCT/JP2020/025112
§ 371(c)(1), (2) Date Dec. 27, 2021,
PCT Pub. No. WO2020/262565, PCT Pub. Date Dec. 30, 2020.
Claims priority of application No. 2019-121877 (JP), filed on Jun. 28, 2019.
Prior Publication US 2022/0242978 A1, Aug. 4, 2022
Int. Cl. C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); C08F 20/40 (2006.01); B33Y 70/00 (2020.01); A61C 7/08 (2006.01); A61C 13/01 (2006.01); A61F 5/56 (2006.01); C07C 69/54 (2006.01); C08K 3/36 (2006.01); B33Y 10/00 (2015.01); B29C 64/124 (2017.01); B29L 31/00 (2006.01)
CPC C08F 20/40 (2013.01) [A61C 7/08 (2013.01); A61C 13/01 (2013.01); A61F 5/566 (2013.01); B33Y 70/00 (2014.12); C07C 69/54 (2013.01); C08K 3/36 (2013.01); B29C 64/124 (2017.08); B29L 2031/753 (2013.01); B33Y 10/00 (2014.12)] 15 Claims
 
1. A curable composition comprising:
79.0 to 99.0% by mass of a polymerizable monomer (a),
0.1 to 10.0% by mass of a photopolymerization initiator (b), and
0.01 to 20.0% by mass of a compound (c) represented by the following general formula (III):

OG Complex Work Unit Chemistry
wherein:
R represents a hydrogen atom or a methyl group;
R1 and R2 each independently represents at least one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, and an aralkyl group;
R3 and R4 each independently represents at least one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group;
R7 represents a hydrogen atom or a methyl group; and
n represents an integer of 2 or more.