CPC B24B 55/06 (2013.01) [B24B 37/34 (2013.01)] | 20 Claims |
1. A substrate processing apparatus comprising:
a first polishing chamber, a second polishing chamber, a dry polishing chamber and a loading chamber on a turntable;
wherein the dry polishing chamber includes
a polishing device on the turntable, and
a chamber cover including a cover plate, an interception filter at an intake port at the cover plate, and a particle barrier connected to the cover plate,
wherein the particle barrier faces the interception filter, and is between the polishing device and the interception filter.
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