US 11,813,289 B2
Encapsulated antimicrobials and related methods of treatment
Peter M. Milgrom, Seattle, WA (US); and Jong Seto, San Francisco, CA (US)
Assigned to ADVANTAGE SILVER DENTAL ARREST, LLC, Salem, OR (US)
Appl. No. 17/252,963
Filed by ADVANTAGE SILVER DENTAL ARREST, LLC, Salem, OR (US)
PCT Filed Apr. 5, 2019, PCT No. PCT/US2019/026017
§ 371(c)(1), (2) Date Dec. 16, 2020,
PCT Pub. No. WO2019/245630, PCT Pub. Date Dec. 26, 2019.
Claims priority of provisional application 62/688,149, filed on Jun. 21, 2018.
Prior Publication US 2021/0128610 A1, May 6, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. A61K 33/38 (2006.01); A61P 1/02 (2006.01); A61K 9/00 (2006.01); A61K 9/50 (2006.01); A61K 47/02 (2006.01); A61K 47/16 (2006.01); A61K 47/32 (2006.01); A61K 47/34 (2017.01); A61K 47/46 (2006.01); A61K 45/06 (2006.01)
CPC A61K 33/38 (2013.01) [A61K 9/0053 (2013.01); A61K 9/501 (2013.01); A61K 9/5073 (2013.01); A61K 9/5089 (2013.01); A61K 45/06 (2013.01); A61K 47/02 (2013.01); A61K 47/16 (2013.01); A61K 47/32 (2013.01); A61K 47/34 (2013.01); A61K 47/46 (2013.01); A61P 1/02 (2018.01)] 12 Claims
 
1. A composition comprising an antimicrobial material encapsulated by a surfactant layer, a hydration layer, and an outer layer of SiO2 in the form of microparticles that are configured to release the antimicrobial material in the presence of an active dental caries lesion but to not release an effective amount of antimicrobial material in the presence of a tooth lacking an active dental caries lesion,
wherein the antimicrobial material is in a solution and is selected from the group consisting of silver diamine fluoride, penicillin, amoxicillin, vancomycin, azithromycin, clarithromycin, cephalexin, cephalosporin, cephazolin, ceftriaxone, ciproflaxin, norfloxacin, rifampin, nitrofurantoin, minocycline, streptomycin, gentamycin, tobramycin, sulfonamides, defensin peptides, gallium compound, selenium compound, mercury compound, arsenic compound, antimony compound, bismuth compound, lead compound, nickel compound, thallium compound, tin compound, cadmium compound, cobalt compound, lysozyme, acylase, octenidine, benzalkonium chloride, cetyltrimethylammonium bromide, dimethyldioctadecylammonium bromide, and furanone.