| US 7,449,348 B1 | ||
| Feedback control of imprint mask feature profile using scatterometry and spacer etchback | ||
| Srikanteswara Dakshina-Murthy, Wappingers Falls, N.Y. (US); Bhanwar Singh, Morgan Hill, Calif. (US); Ramkumar Subramanian, Sunnyvale, Calif. (US); and Khoi A. Phan, San Jose, Calif. (US) | ||
| Assigned to Advanced Micro Devices, Inc., Sunnyvale, Calif. (US) | ||
| Filed on Jun. 02, 2004, as Appl. No. 10/858,605. | ||
| This patent is subject to a terminal disclaimer. | ||
| Int. Cl. H01L 21/00 (2006.01) | ||
| U.S. Cl. 438—7 [438/4; 438/5; 438/12; 257/E21.525; 257/E21.527] | 14 Claims |
| 1. A method for providing feedback control of imprint mask feature profile, comprising:
monitoring an imprint mask;
detecting at least one retrograde profile having a negative slope on mask features wherein an angle between a horizontal surface
of the mask and an outerside of at least one of the mask features is acute; and
altering the imprint mask to compensate for the at least one retrograde profile such that wafer material is mitigated from
being torn loose upon removal of the imprint mask from a wafer being imprinted therewith.
|