US 11,812,602 B2
Semiconductor device and method of manufacturing the semiconductor device
Kang Sik Choi, Icheon-si (KR)
Assigned to SK hynix Inc., Icheon-si (KR)
Filed by SK hynix Inc., Icheon-si (KR)
Filed on Jun. 22, 2021, as Appl. No. 17/354,904.
Claims priority of application No. 10-2020-0172668 (KR), filed on Dec. 10, 2020.
Prior Publication US 2022/0189958 A1, Jun. 16, 2022
Int. Cl. H10B 12/00 (2023.01)
CPC H10B 12/30 (2023.02) [H10B 12/03 (2023.02); H10B 12/05 (2023.02)] 25 Claims
OG exemplary drawing
 
12. A semiconductor device, comprising:
a first stacked body comprising a first stacked insulating layer and a first stacked conductive layer that are alternately stacked;
a capacitor plug passing through the first stacked body;
a capacitor insulating layer configured to enclose the capacitor plug;
a capacitor multi-layered layer configured to enclose the capacitor insulating layer;
an electrode disposed under the capacitor plug; and
a connection conductor comprising a penetrating conductive part passing through the capacitor insulating layer and the capacitor multi-layered layer,
wherein the connection conductor is configured to couple the capacitor plug to the electrode.