US 11,810,796 B2
Wafer cleaning method and apparatus therefore
Christoph Semmelrock, Villach (AT); Ulrich Tschinderle, Villach (AT); Reinhard Sellmer, Villach (AT); and Walter Esterl, Villach (AT)
Assigned to LAM RESEARCH AG, Villach (AT)
Appl. No. 17/270,332
Filed by LAM RESEARCH AG, Villach (AT)
PCT Filed Sep. 16, 2019, PCT No. PCT/EP2019/074637
§ 371(c)(1), (2) Date Feb. 22, 2021,
PCT Pub. No. WO2020/058159, PCT Pub. Date Mar. 26, 2020.
Claims priority of application No. 1815163.9 (GB), filed on Sep. 18, 2018.
Prior Publication US 2021/0320016 A1, Oct. 14, 2021
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/6704 (2013.01) [H01L 21/67075 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A liquid dispensing device suitable for carrying out a method for treating the surface of a wafer with multiple liquids, the method comprising rotating the surface of the wafer and discharging different liquid streams onto the rotating surface in a sequence from separate outlets, wherein the discharge of liquid streams which are contiguous in the sequence overlaps during a transition phase, and wherein during the transition phase the liquid streams merge after exiting said outlets to form a merged liquid stream before impacting the rotating surface;
wherein the liquid dispensing device comprises:
a housing, defining an internal chamber opening at an exit port;
a spacer, located within the internal chamber of the housing; and
two or more liquid delivery tubes, passing along the spacer within the internal chamber of the housing, and extending to the exit port;
wherein the two or more liquid delivery tubes are bent around the spacer so that the tubes' outlets are inwardly angled towards one another, such that in use liquid streams delivered from the outlets of the two or more liquid delivery tubes merge to form a merged liquid stream.
 
6. A cleaning apparatus for carrying out a method for treating the surface of a wafer with multiple liquids, the method comprising rotating the surface of the wafer and discharging different liquid streams onto the rotating surface in a sequence from separate outlets, wherein the discharge of liquid streams which are contiguous in the sequence overlaps during a transition phase, and wherein during the transition phase the liquid streams merge after exiting said outlets to form a merged liquid stream before impacting the rotating surface, the cleaning apparatus comprising:
a cleaning chamber; and
a rotatable wafer holder in the cleaning chamber;
a liquid dispensing device comprising:
a housing, defining an internal chamber opening at an exit port;
a spacer, located within the internal chamber of the housing; and
two or more liquid delivery tubes, passing along the spacer within the internal chamber of the housing, and extending to the exit port;
wherein the two or more liquid delivery tubes are bent around the spacer so that the tubes' outlets are inwardly angled towards one another, such that in use liquid streams delivered from the outlets of the two or more liquid delivery tubes merge to form a merged liquid stream.