US 11,809,090 B2
Composite overlay metrology target
Anna Golotsvan, Qiryat Tivon (IL); Inna Steely-Tarshish, Haifa (IL); Mark Ghinovker, Yoqneam Ilit (IL); and Rawi Dirawi, Milpitas, CA (US)
Assigned to KLA Corporation, Milpitas, CA (US)
Filed by KLA Corporation, Milpitas, CA (US)
Filed on Aug. 18, 2020, as Appl. No. 16/996,254.
Claims priority of provisional application 63/032,217, filed on May 29, 2020.
Claims priority of provisional application 62/967,951, filed on Jan. 30, 2020.
Prior Publication US 2021/0240089 A1, Aug. 5, 2021
Int. Cl. G01N 21/47 (2006.01); G03F 7/00 (2006.01); G01N 23/2251 (2018.01)
CPC G03F 7/70633 (2013.01) [G01N 21/47 (2013.01); G01N 23/2251 (2013.01); G03F 7/70608 (2013.01); G03F 7/70683 (2013.01); G01N 2223/07 (2013.01)] 49 Claims
OG exemplary drawing
 
1. A metrology target comprising:
a first set of pattern elements, wherein the first set of pattern elements are compatible with a first metrology mode of a first metrology sub-system along one or more directions; and
a second set of pattern elements, wherein the second set of pattern elements is compatible with a second metrology mode of a second metrology sub-system along the one or more directions, wherein the second set of pattern elements includes a first portion of the first set of pattern elements, and wherein the second set of pattern elements is surrounded by a second portion of the first set of pattern elements not included in the second set of pattern elements.