US 11,809,085 B2
Mirror, in particular for a microlithographic projection exposure apparatus
Hans Michael Stiepan, Aalen (DE); and Toralf Gruner, Aalen (DE)
Assigned to CARL ZEISS SMT GMBH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Dec. 20, 2021, as Appl. No. 17/555,573.
Application 17/555,573 is a continuation of application No. PCT/EP2020/065938, filed on Jun. 9, 2020.
Claims priority of application No. 102019208934.8 (DE), filed on Jun. 19, 2019.
Prior Publication US 2022/0113634 A1, Apr. 14, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01); C03C 17/10 (2006.01); G02B 5/08 (2006.01); G02B 26/08 (2006.01)
CPC G03F 7/70316 (2013.01) [C03C 17/10 (2013.01); G02B 5/0891 (2013.01); G02B 26/0858 (2013.01); G03F 7/7015 (2013.01); G03F 7/70266 (2013.01)] 22 Claims
OG exemplary drawing
 
1. Mirror having an optical effective surface, comprising:
a mirror substrate;
a reflection layer system that reflects electromagnetic radiation incident on the optical effective surface;
at least one piezoelectric layer, arranged between the mirror substrate and the reflection layer system; and
a first electrode arrangement situated on a side of the piezoelectric layer facing the reflection layer system, and a second electrode arrangement situated on a side of the piezoelectric layer facing the mirror substrate;
wherein the first electrode arrangement and the second electrode arrangement are arranged to apply an electric field to the piezoelectric layer that produces a locally variable deformation in the piezoelectric layer;
wherein one of the electrode arrangements is assigned a mediator layer having an electrical conductivity less than 200 siemens/meter that sets an at least regionally continuous electrical potential profile along the respective electrode arrangement; and
wherein the mediator layer has at least two mutually electrically insulated regions, wherein the mutually electrically insulated regions of the mediator layer extend along the piezoelectric layer.