US 11,809,083 B2
EUV photolithography system fuel source and methods of operating the same
Cheng-Hao Lai, Hsinchu (TW); Ming-Hsun Tsai, Hsinchu (TW); Hsin-Feng Chen, Hsinchu (TW); Wei-Shin Cheng, Hsinchu (TW); Yu-Kuang Sun, Hsinchu (TW); Cheng-Hsuan Wu, Hsinchu (TW); Yu-Fa Lo, Hsinchu (TW); Shih-Yu Tu, Hsinchu (TW); Jou-Hsuan Lu, Hsinchu (TW); Shang-Chieh Chien, Hsinchu (TW); Li-Jui Chen, Hsinchu (TW); and Heng-Hsin Liu, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Oct. 5, 2021, as Appl. No. 17/494,558.
Claims priority of provisional application 63/175,995, filed on Apr. 16, 2021.
Prior Publication US 2022/0334495 A1, Oct. 20, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70033 (2013.01) 20 Claims
OG exemplary drawing
 
1. A method of processing fuel in an EUV photolithography system, the method comprising:
forming a volume of liquid fuel in a vessel, the liquid fuel including impurities;
concentrating the impurities in the liquid fuel; and
suctioning the impurities out of the liquid fuel.