CPC G03F 1/24 (2013.01) [G03F 1/52 (2013.01); G03F 1/54 (2013.01); G03F 1/80 (2013.01)] | 20 Claims |
1. A lithography mask, comprising:
a substrate;
a first layer of a reflective structure disposed over the substrate; and
a second layer of the reflective structure disposed over the first layer;
wherein:
the first layer and the second layer have different material compositions;
the second layer includes a plurality of segments that are within the second layer, the segments being separated from one another by a plurality of gaps; and
at least some of the segments of the second layer each has a slanted sidewall.
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