US 11,808,746 B2
Concentration sensor for precursor delivery system
Vivek B. Shah, Santa Clara, CA (US); Varoujan Chakarian, North Hills, CA (US); and Upendra Ummethala, Cupertino, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jul. 1, 2021, as Appl. No. 17/365,906.
Prior Publication US 2023/0003704 A1, Jan. 5, 2023
Int. Cl. G01N 33/00 (2006.01); C23C 16/52 (2006.01); G01F 1/74 (2006.01); G01N 11/02 (2006.01)
CPC G01N 33/0016 (2013.01) [C23C 16/52 (2013.01); G01F 1/74 (2013.01); G01N 11/02 (2013.01); G01N 33/0073 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A concentration sensor assembly, comprising:
a vaporization chamber comprising a compound, the vaporization chamber to transition the compound into a gaseous state;
a first flow path coupled to the vaporization chamber, the first flow path to direct a first gas to the vaporization chamber;
a second flow path coupled to the vaporization chamber, the second flow path to direct a second gas out of the vaporization chamber, wherein the second gas comprises the compound and the first gas;
a first sensor disposed along the first flow path, the first sensor to measure first flow data indicative of a first mass flow rate of the first gas within the first flow path;
a second sensor disposed along the second flow path, the second sensor to measure second flow data indicative of a second mass flow rate of the second gas within the second flow path;
a third sensor to measure third flow data indicative of a third mass flow rate of the compound into the vaporization chamber; and
a controller coupled to the first sensor and the second sensor, the controller to determine a concentration of the compound within the second gas based on the first flow data, the second flow data, and the third flow data.