CPC C25D 3/16 (2013.01) [B32B 3/26 (2013.01); B32B 15/04 (2013.01); B32B 15/043 (2013.01); C25D 5/02 (2013.01); C25D 5/18 (2013.01); C25D 5/611 (2020.08); C25D 7/00 (2013.01); C25D 7/123 (2013.01); Y10T 428/1291 (2015.01); Y10T 428/12931 (2015.01); Y10T 428/12937 (2015.01); Y10T 428/12993 (2015.01); Y10T 428/2495 (2015.01); Y10T 428/24942 (2015.01); Y10T 428/265 (2015.01)] | 16 Claims |
1. An electroplated cobalt deposit on a surface of a substrate, wherein the cobalt deposit electroplated on the surface of the substrate comprises sub-micron recessed features and non-feature areas and the cobalt deposit exhibits a level, seam-free bottom-up fill in the submicron recessed features and plating on the non-feature areas, wherein a change in overburden thickness between the sub-micron recessed features and the non-feature areas is less than about 50 nm, wherein the cobalt deposit exhibits a potentiodynamically measured hysteresis loop in a cyclic voltammetry scan at a current density in the range of about 5 to about 10 mA/cm2 of less than about 50 mV,
wherein the electroplated cobalt deposit is formed by immersing the substrate into a cobalt electrolyte comprising:
1) a source of cobalt ions;
2) boric acid;
3) a pH adjuster;
4) an organic additive, wherein said organic additive comprises a reaction product of an alkoxylated propargyl alcohol or propargyl alcohol with a second component, wherein the second component comprises glycidol, propylene oxide, glycidol and propylene oxide, or propylene glycol and glycidol;
wherein the cobalt electrolyte is at least essentially free of chloride ions;
wherein the cobalt electrolyte is at least substantially free of an accelerator;
wherein the cobalt electrolyte contains less than 0.1 mg/L of divalent sulfur compounds.
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