US 11,807,951 B2
Cobalt chemistry for smooth topology
Shaopeng Sun, Orange, CT (US); Kyle Whitten, Hamden, CT (US); Stephan Braye, West Haven, CT (US); and Elie Najjar, Norwood, MA (US)
Assigned to MacDermid Enthone Inc., Waterbury, CT (US)
Filed by MacDermid Enthone Inc., Waterbury, CT (US)
Filed on Nov. 11, 2021, as Appl. No. 17/524,450.
Application 17/524,450 is a continuation of application No. 16/713,871, filed on Dec. 13, 2019, granted, now 11,230,778.
Prior Publication US 2022/0136123 A1, May 5, 2022
Int. Cl. C25D 3/16 (2006.01); C25D 5/02 (2006.01); C25D 5/18 (2006.01); C25D 7/12 (2006.01); B32B 15/04 (2006.01); B32B 3/26 (2006.01); C25D 5/00 (2006.01); C25D 7/00 (2006.01)
CPC C25D 3/16 (2013.01) [B32B 3/26 (2013.01); B32B 15/04 (2013.01); B32B 15/043 (2013.01); C25D 5/02 (2013.01); C25D 5/18 (2013.01); C25D 5/611 (2020.08); C25D 7/00 (2013.01); C25D 7/123 (2013.01); Y10T 428/1291 (2015.01); Y10T 428/12931 (2015.01); Y10T 428/12937 (2015.01); Y10T 428/12993 (2015.01); Y10T 428/2495 (2015.01); Y10T 428/24942 (2015.01); Y10T 428/265 (2015.01)] 16 Claims
OG exemplary drawing
 
1. An electroplated cobalt deposit on a surface of a substrate, wherein the cobalt deposit electroplated on the surface of the substrate comprises sub-micron recessed features and non-feature areas and the cobalt deposit exhibits a level, seam-free bottom-up fill in the submicron recessed features and plating on the non-feature areas, wherein a change in overburden thickness between the sub-micron recessed features and the non-feature areas is less than about 50 nm, wherein the cobalt deposit exhibits a potentiodynamically measured hysteresis loop in a cyclic voltammetry scan at a current density in the range of about 5 to about 10 mA/cm2 of less than about 50 mV,
wherein the electroplated cobalt deposit is formed by immersing the substrate into a cobalt electrolyte comprising:
1) a source of cobalt ions;
2) boric acid;
3) a pH adjuster;
4) an organic additive, wherein said organic additive comprises a reaction product of an alkoxylated propargyl alcohol or propargyl alcohol with a second component, wherein the second component comprises glycidol, propylene oxide, glycidol and propylene oxide, or propylene glycol and glycidol;
wherein the cobalt electrolyte is at least essentially free of chloride ions;
wherein the cobalt electrolyte is at least substantially free of an accelerator;
wherein the cobalt electrolyte contains less than 0.1 mg/L of divalent sulfur compounds.