| US 11,807,529 B1 | ||
| Photosensitized release of nitric oxide | ||
| Antonio E. Alegria, Trujillo Alto, PR (US); and Pedro Sanchez Cruz, Humacao, PR (US) | ||
| Assigned to University of Puerto Rico, San Juan, PR (US) | ||
| Filed by Antonio E. Alegria, Trujillo Alto, PR (US); and Pedro Sanchez Cruz, Humacao, PR (US) | ||
| Filed on May 25, 2020, as Appl. No. 16/882,709. | ||
| Application 16/882,709 is a division of application No. 15/615,510, filed on Jun. 6, 2017, granted, now 10,662,063, issued on May 26, 2020. | ||
| Int. Cl. C01B 21/24 (2006.01); C07C 243/06 (2006.01) | ||
| CPC C01B 21/24 (2013.01) [C07C 243/06 (2013.01)] | 4 Claims |
|
1. A method of photosensitized production of Nitride Oxide (NO) comprising:
photoirradiating a solution containing 2-methyl-2-nitrosopropane (MNP) and aluminum phthalocyanine tetrasulfonate (AlPcS4) in the presence of a sacrificial electron donor compound, wherein Nitride Oxide (NO) is produced. |