US 7,617,474 B2
System and method for providing defect printability analysis of photolithographic masks with job-based automation
Linyong Pang, Castro Valley, Calif. (US); and Fang-Cheng Chang, Los Altos, Calif. (US)
Assigned to Synopsys, Inc., Mountain View, Calif. (US)
Filed on Jun. 26, 2006, as Appl. No. 11/426,566.
Application 11/426566 is a division of application No. 10/618816, filed on Jul. 11, 2003, granted, now 7,093,229.
Application 10/372066 is a division of application No. 09/544798, filed on Apr. 07, 2000, granted, now 6,578,188.
Application 10/618816 is a continuation in part of application No. 10/372066, filed on Feb. 20, 2003, granted, now 7,003,755.
Application 09/544798 is a continuation in part of application No. 09/130996, filed on Aug. 07, 1998, granted, now 6,757,645.
Claims priority of provisional application 60/059306, filed on Sep. 17, 1997.
Prior Publication US 2006/0242619 A1, Oct. 26, 2006
Int. Cl. G06F 17/50 (2006.01)
U.S. Cl. 716—19  [716/4; 716/5; 716/21; 703/13] 11 Claims
OG exemplary drawing
 
1. A graphic user interface (GUI) for defect printability analysis on a photolithographic mask using simulation, the GUI comprising:
a main menu bar including:
a plurality of setting links;
a job run link; and
a plurality of review links,
wherein the plurality of setting links allow a user to input parameters used to perform the simulation on the photolithographic mask, the job run link allows a user to designate a job type as one of the simulation and an automatic defect severity score, and the plurality of review links allow the user to view results of the simulation at different levels of detail.