US 7,615,121 B2
	Susceptor system
Giacomo Nicolao Maccalli, Milan (Italy); Gianluca Valente, Milan (Italy); Olle Kordina, Oldsmar, Fla. (US); Franco Preti, Milan (Italy); and Danilo Crippa, Novara (Italy)
Assigned to E.T.C. Epitaxial Technology Center SRL, Catania (Italy)
Appl. No. 10/538,529 PCT Filed Dec. 10, 2002, PCT No. PCT/IT02/00774 § 371(c)(1), (2), (4) Date Jun. 10, 2005, PCT Pub. No. WO2004/053188, PCT Pub. Date Jun. 24, 2004.
Prior Publication US 2006/0118048 A1, Jun. 08, 2006
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/46 (2006.01); H01L 21/00 (2006.01)

U.S. Cl. 118—728  [118/725]

27 Claims

1. A susceptor system for an apparatus of the type adapted to treat substrates and/or wafers, the susceptor system being provided with a cavity (1) which acts as a chamber for the treatment of the substrates and/or wafers and which extends in a longitudinal direction and is delimited by an upper wall (2), by a lower wall (3), by a right-hand side wall (4), and by a left-hand side wall (5), the upper wall (2) being constituted by at least one piece of electrically conducting material suitable for being heated by electromagnetic induction, the lower wall (3) being constituted by at least one piece of electrically conducting material suitable for being heated by electromagnetic induction, the right-hand side wall (4) being made in its entirety by at least one piece of inert, refractory material and preventing conduction of electrical current there through, the left-hand side wall (5) being made in its entirety by at least one piece of inert, refractory material and preventing conduction of electrical current there through, the right-hand side wall (4) and the left-hand side wall (5) each separating the upper wall (2) from the lower wall (3) SO that the or each piece of the upper wall (2) is electrically insulated from the or each piece of the lower wall (3), the walls (2, 3, 4, 5) being included in the susceptor system.