US 7,614,421 B2
	Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases
W. Karl Olander, Indian Shores, Fla. (US); Matthew B. Donatucci, Bethel, Conn. (US); Luping Wang, Brookfield, Conn. (US); and Michael J. Wodjenski, New Milford, Conn. (US)
Assigned to Advanced Technology Materials, Inc., Danbury, Conn. (US)
Filed on Feb. 23, 2006, as Appl. No. 11/360,732.
Application 11/360732 is a continuation of application No. 11/062509, filed on Feb. 22, 2005, granted, now 7,328,716.
Application 11/062509 is a continuation of application No. 10/166242, filed on Jun. 10, 2002, granted, now 6,857,447.
Prior Publication US 2006/0174944 A1, Aug. 10, 2006
This patent is subject to a terminal disclaimer.
Int. Cl. F16K 3/36 (2006.01); B08B 9/027 (2006.01); G05B 11/01 (2006.01)

U.S. Cl. 137—487.5  [137/240; 137/486; 137/551; 134/95.1; 134/98.1; 134/171; 222/148]

62 Claims

1. A gas supply manifold arranged to receive discharged gas from a pressure-regulated gas source vessel, wherein the gas supply manifold is isolatable from the pressure-regulated gas source vessel when a predetermined occurrence is detected in the gas supply manifold wherein the pressure-regulated gas source vessel comprises an interior volume, and a gas regulator or a series-arranged assembly of gas regulators is in said interior volume to regulate gas dispensing from the vessel.