| US 7,614,145 B2 | ||
| Method for manufacturing multilayer circuit board and resin base material | ||
| Yasuhiro Wakizaka, Tokyo (Japan); Koichi Ikeda, Tokyo (Japan); and Naoki Kanda, Tokyo (Japan) | ||
| Assigned to Zeon Corporation, Tokyo (Japan) | ||
| Appl. No. 10/487,997 PCT Filed Sep. 04, 2002, PCT No. PCT/JP02/08976 § 371(c)(1), (2), (4) Date Feb. 27, 2004, PCT Pub. No. WO03/024174, PCT Pub. Date Mar. 20, 2003. |
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| Claims priority of application No. 2001-268847 (JP), filed on Sep. 05, 2001; application No. 2002-054808 (JP), filed on Feb. 28, 2002; and application No. 2002-217513 (JP), filed on Jul. 26, 2002. | ||
| Prior Publication US 2004/0237295 A1, Dec. 02, 2004 | ||
| Int. Cl. H05K 3/38 (2006.01); H05K 3/46 (2006.01) | ||
| U.S. Cl. 29—846 [29/847; 174/259; 427/97.6; 427/99.2; 427/340; 427/384] | 20 Claims |

| 20. A method for manufacturing a resin base material on which a metallic thin film is formed comprising:
i) step i of bringing a compound having a structure capable of coordinating to metal atoms or metal ions into contact with
one or both sides of a resin base material formed from a curable resin composition containing an insulating resin and a curing
agent, and removing an excess of said compound from the one or both sides of the resin base material after said contact of
said compound with the one or both sides of the resin base material, wherein said compound is I) an organic compound having
an amino group, a thiol group, a carboxyl group, or a cyano group, II) a heterocyclic compound having a nitrogen atom, an
oxygen atom, or a sulfur atom, or III) an imidazole, a pyrazole, a triazole, or a triazine having an amino group, a thiol
group, a carboxyl group, or a cyano group, wherein said compound is penetrated into the one or both sides of the resin base
material, and wherein the excess of said compound is removed from the surface of said resin base material whereby no layer
of said compound is formed on the one or both sides of the resin base material;
ii) step ii of curing said resin base material to form a cured resin base material, wherein the compound having a structure
capable of coordinating to metal atoms or metal ions has penetrated into the cured resin base material and is held within
the cured resin base material; and
iii) step iii of performing electroless plating or sputtering to form a metallic thin film on the surface of said cured resin
base material.
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