| US 7,612,865 B2 | ||
| Pattern writing apparatus and pattern writing method | ||
| Katsuyuki Hisaoka, Kyoto (Japan); and Hiroyuki Shirota, Kyoto (Japan) | ||
| Assigned to Dainippon Screen Mfg. Co., Ltd., Kyoto (Japan) | ||
| Filed on Aug. 31, 2007, as Appl. No. 11/896,357. | ||
| Claims priority of application No. P2006-247619 (JP), filed on Sep. 13, 2006. | ||
| Prior Publication US 2008/0062398 A1, Mar. 13, 2008 | ||
| Int. Cl. G03B 27/54 (2006.01); G03B 27/32 (2006.01); B41J 2/47 (2006.01); B41J 15/14 (2006.01); G03F 1/00 (2006.01) | ||
| U.S. Cl. 355—67 [355/77; 347/239; 347/241; 430/322] | 22 Claims |
| 1. A pattern writing apparatus for writing a pattern on a photosensitive material by light irradiation on said photosensitive
material, comprising:
a light emitting part for emitting light to a photosensitive material;
an irradiation region moving mechanism for moving an irradiation region group on said photosensitive material, said irradiation
region group irradiated with light emitted from said light emitting part; and
a control part for controlling movement of said irradiation region group and light irradiation on respective irradiation regions
included in said irradiation region group to perform writing on said photosensitive material by applying light to each position
on said photosensitive material while passing a plurality of irradiation regions over said each position, wherein
light irradiation is performed on a preceding strip region on said photosensitive material by controlling light irradiation
on a preceding irradiation region group by said light emitting part and moving said preceding irradiation region group in
parallel with a main scan direction, and light irradiation is performed on a following strip region which is adjacent to and
partially overlaps with said preceding strip region by controlling light irradiation on a following irradiation region group
by said light emitting part and moving said following irradiation region group in parallel with said main scan direction,
and
said preceding irradiation region group or said following irradiation region group continuously passes each position of a
non-overlapping area which belongs to said preceding strip region or said following strip region in a constant time, and a
cumulative passage time in which said preceding irradiation region group and said following irradiation region group pass
each position of an overlapping area between said preceding strip region and said following strip region is shorter than said
constant time.
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