US 7,608,389 B2
Photoresists processable under biocompatible conditions for multi-biomolecule patterning
Panagiotis Argitis, Institute of Microelectronics, NCSR “Demokritos” Aghia Paraskevi, Athens Gr-15310 (Greece); Konstantinos Misiakos, Institute of Microelectronics, NCSR “Demokritos” Aghia Paraskevi, Athens GR-15310 (Greece); Sotirios E. Kakabakos, Institute of Radioisotopes and Radiodiagnostic Products, NCSR “Demonkritos” Aghia Paraskevi, Athens GR-15310 (Greece); and Constantinos D. Diakoumakos, Athens (Greece)
Assigned to National Centre for Scientific Research Demokritos, (Greece); Panagiotis Argitis, (Greece); Konstantinos Misiakos, (Greece); and Sotirios E. Kakabakos, (Greece)
Appl. No. 10/479,293
PCT Filed May 30, 2002, PCT No. PCT/GR02/00033
§ 371(c)(1), (2), (4) Date Oct. 12, 2004,
PCT Pub. No. WO02/097533, PCT Pub. Date Dec. 05, 2002.
Claims priority of application No. 20010100271 (GR), filed on May 31, 2001.
Prior Publication US 2005/0037276 A1, Feb. 17, 2005
Int. Cl. G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01)
U.S. Cl. 430—315  [430/270.1; 430/311; 430/312; 430/320; 430/321; 430/325; 430/326; 430/329; 430/331; 430/905; 430/910] 8 Claims
OG exemplary drawing
 
2. Method of photolithographic processing using photoresist comprising a copolymer synthesized from monomers, wherein at least one of said monomers contains an acid cleavable group and at least one of said monomers contains a hydrophilic group selected from the class of hydroxyls and carboxyls, comprising the steps of exposure of selected photoresist areas, dissolution of said photoresist areas and deposition of biomolecules on the substrate, wherein the step of dissolution is accomplished using dilute aqueous base developer that is less than 0.01 N base concentration and wherein exposure of selected photoresist areas and the subsequent dissolution of said photoresist areas follows the deposition of biomolecules on the substrate without deactivating the deposited biomolecules.