| US 7,602,474 B2 | ||
| Exposure apparatus | ||
| Kenichiro Mori, Utsunomiya (Japan); Akihiro Yamada, Utsunomiya (Japan); and Noboru Osaka, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Jul. 02, 2007, as Appl. No. 11/772,437. | ||
| Claims priority of application No. 2006-183851 (JP), filed on Jul. 03, 2006. | ||
| Prior Publication US 2008/0123055 A1, May 29, 2008 | ||
| Int. Cl. G03B 27/72 (2006.01); G03B 27/54 (2006.01) | ||
| U.S. Cl. 355—71 [355/67] | 3 Claims |
| 1. An exposure apparatus which exposes a substrate to light, said apparatus comprising:
an illumination optical system which illuminates a mask with illumination light, the illumination light containing a primary
component of polarized light and a secondary component of the polarized light, which are perpendicular to each other, and
said illumination optical system including a phase difference adjusting unit configured to adjust a phase difference between
the primary component of the polarized light and the secondary component of the polarized light without changing a direction
of the primary component of the polarized light; and
a projection optical system which projects a pattern of the mask onto the substrate,
wherein said phase difference adjusting unit includes a phase difference adjusting plate made of a uniaxial crystal, and an
actuator which rotates said phase difference adjusting plate about an axis perpendicular to the optical axis of said illumination
optical system.
|