US 7,601,972 B2
Inspection system by charged particle beam and method of manufacturing devices using the system
Mamoru Nakasuji, Kanagawa (Japan); Nobuharu Noji, Kanagawa (Japan); Tohru Satake, Kanagawa (Japan); Toshifumi Kimba, Kanagawa (Japan); Hirosi Sobukawa, Kanagawa (Japan); Shoji Yoshikawa, Tokyo (Japan); Tsutomu Karimata, Kanagawa (Japan); Shin Oowada, Kanagawa (Japan); Mutsumi Saito, Kanagawa (Japan); Muneki Hamashima, Chiba (Japan); and Toru Takagi, Kanagawa (Japan)
Assigned to Ebara Corporation, Tokyo (Japan)
Filed on Oct. 09, 2007, as Appl. No. 11/907,097.
Application 11/907097 is a division of application No. 11/528595, filed on Sep. 28, 2006, granted, now 7,297,949.
Application 11/528595 is a division of application No. 09/891611, filed on Jun. 27, 2001, granted, now 7,135,676, filed on Oct. 04, 2007.
Claims priority of application No. 2000-192918 (JP), filed on Jun. 27, 2000; application No. 2000-335751 (JP), filed on Nov. 02, 2000; application No. 2000-335752 (JP), filed on Nov. 02, 2000; application No. 2000-336091 (JP), filed on Nov. 02, 2000; application No. 2000-336156 (JP), filed on Nov. 02, 2000; application No. 2000-337058 (JP), filed on Nov. 06, 2000; application No. 2000-377285 (JP), filed on Dec. 12, 2000; application No. 2001-031901 (JP), filed on Feb. 08, 2001; application No. 2001-031906 (JP), filed on Feb. 08, 2001; application No. 2001-033599 (JP), filed on Feb. 09, 2001; application No. 2001-112745 (JP), filed on Apr. 11, 2001; application No. 2001-115060 (JP), filed on Apr. 13, 2001; application No. 2001-143084 (JP), filed on May 14, 2001; and application No. 2001-158571 (JP), filed on May 28, 2001.
Prior Publication US 2008/0042060 A1, Feb. 21, 2008
Int. Cl. H01J 37/18 (2006.01)
U.S. Cl. 250—441.11 8 Claims
OG exemplary drawing
 
1. A charged particle beam apparatus wherein a sample is placed on an XY-stage so as to be moved to a predetermined position in a vacuum atmosphere, and a charged particle beam is irradiated on a surface of the sample, wherein the XY-stage has a non-contact supporting mechanism with a hydrostatic bearing and a vacuum sealing mechanism by differential exhausting, a conductance reducing division plate is disposed between a location where the surface of the sample is irradiated by the charged beam and a hydrostatic bearing supporting portion of the XY-stage, and a pressure difference is generated between a region of irradiation of the charged particle beam and the hydrostatic bearing supporting portion, wherein a divider is disposed around the portion irradiated by the charged particle beam, and wherein the divider has an insulating material to prevent electric discharge.