|
|
US 7,601,972 B2 |
|
| Inspection system by charged particle beam and method of manufacturing devices using the system |
| Mamoru Nakasuji, Kanagawa (Japan); Nobuharu Noji, Kanagawa (Japan); Tohru Satake, Kanagawa (Japan); Toshifumi Kimba, Kanagawa (Japan); Hirosi Sobukawa, Kanagawa (Japan); Shoji Yoshikawa, Tokyo (Japan); Tsutomu Karimata, Kanagawa (Japan); Shin Oowada, Kanagawa (Japan); Mutsumi Saito, Kanagawa (Japan); Muneki Hamashima, Chiba (Japan); and Toru Takagi, Kanagawa (Japan) |
| Assigned to Ebara Corporation, Tokyo (Japan) |
| Filed on Oct. 09, 2007, as Appl. No. 11/907,097. |
| Application 11/907097 is a division of application No. 11/528595, filed on Sep. 28, 2006, granted, now 7,297,949. |
| Application 11/528595 is a division of application No. 09/891611, filed on Jun. 27, 2001, granted, now 7,135,676, filed on Oct. 04, 2007. |
| Claims priority of application No. 2000-192918 (JP), filed on Jun. 27, 2000; application No. 2000-335751 (JP), filed on Nov. 02, 2000; application No. 2000-335752 (JP), filed on Nov. 02, 2000; application No. 2000-336091 (JP), filed on Nov. 02, 2000; application No. 2000-336156 (JP), filed on Nov. 02, 2000; application No. 2000-337058 (JP), filed on Nov. 06, 2000; application No. 2000-377285 (JP), filed on Dec. 12, 2000; application No. 2001-031901 (JP), filed on Feb. 08, 2001; application No. 2001-031906 (JP), filed on Feb. 08, 2001; application No. 2001-033599 (JP), filed on Feb. 09, 2001; application No. 2001-112745 (JP), filed on Apr. 11, 2001; application No. 2001-115060 (JP), filed on Apr. 13, 2001; application No. 2001-143084 (JP), filed on May 14, 2001; and application No. 2001-158571 (JP), filed on May 28, 2001. |
| Prior Publication US 2008/0042060 A1, Feb. 21, 2008 |
| Int. Cl. H01J 37/18 (2006.01)
|