| US 7,601,405 B2 | ||
| DLC coating system and process and apparatus for making coating system | ||
| Orlaw Massler, Eschen (Liechtenstein); Mauro Pedrazzini, Eschen (Liechtenstein); Christian Wohlrab, Rueti/ZH (Switzerland); Hubert Eberle, Planken (Liechtenstein); Martin Grischke, Triesen (Liechtenstein); and Thorsten Michler, Mainz (Germany) | ||
| Assigned to Oerlikon Trading AG, Truebbach, Truebbach (Switzerland) | ||
| Filed on Jan. 11, 2008, as Appl. No. 12/13,003. | ||
| Application 10/771331 is a division of application No. 09/551883, filed on Apr. 18, 2000, granted, now 6,740,393, filed on May 25, 2004. | ||
| Application 12/013003 is a continuation of application No. 10/771331, filed on Feb. 05, 2004, abandoned. | ||
| Claims priority of application No. 100 18 143 (DE), filed on Apr. 12, 2000. | ||
| Prior Publication US 2008/0311310 A1, Dec. 18, 2008 | ||
| Int. Cl. H05H 1/24 (2006.01) | ||
| U.S. Cl. 427—577 [427/569] | 22 Claims |
| 1. A process for producing a layer system for the protection against wear, for the protection against corrosion and for improving
the sliding properties, having an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement
on the adhesive layer and a cover layer of an adamantine carbon,
comprising
a) charging the substrate into a vacuum chamber and pumping down to a vacuum of a starting pressure of less than 10−4 mbar, preferably 10−5 mbar,
b) cleaning a surface of the substrate,
c) plasma-aided vapor-depositing of the adhesive layer on the substrate,
d) applying the transition layer to the adhesion layer by simultaneous plasma-aided vapor depositing of adhesion layer constituents
and depositing carbon from the gas phase,
e) applying the adamantine carbon layer on the transition layer by a plasma-aided depositing of carbon from the gas phase,
wherein
at least during process steps c), d) and e), a substrate bias voltage is applied to the substrate, and at least during process
steps d) and e), the plasma is stabilized by a longitudinal magnetic field, and wherein the magnetic flux course of the magnetic
field is produced by two electromagnetic coils bounding the vacuum chamber on opposite sides thereof and current is introduced
such that a mutually reinforcing magnetic field is created which is directed in the same direction at both coils, or the magnetic
flux course of the magnetic field is also produced by only one coil for a smaller chamber, and the magnetic field is variable
with respect to time and space for counteracting secondary plasmas in that the coil currents are displaced together with one
another or are displaced against one another.
|