| US 7,598,360 B2 | ||
| Bisstyryl compound and high density recording media utilizing the same | ||
| Shin-Shin Wang, Hsinchu (Taiwan); Chien-Wen Chen, Pingtung County (Taiwan); Jong-Lieh Yang, Hsinchu (Taiwan); Chii-Chang Lai, Taichung Hsien (Taiwan); Hui-Ping Tsai, Hsinchu (Taiwan); Wen-Ping Chu, Taichung (Taiwan); Wen-Yih Liao, Taichung (Taiwan); Chien-Liang Huang, Taoyuan County (Taiwan); Tzuan-Ren Jeng, Hsinchu (Taiwan); Ching-Yu Hsieh, Hsinchu County (Taiwan); and An-Tse Lee, Taipei County (Taiwan) | ||
| Assigned to Industrial Technology Research Institute, Hsinchu (Taiwan) | ||
| Filed on Oct. 21, 2005, as Appl. No. 11/254,663. | ||
| Claims priority of application No. 94122690 A (TW), filed on Jul. 05, 2005. | ||
| Prior Publication US 2007/0009825 A1, Jan. 11, 2007 | ||
| Int. Cl. C07D 403/06 (2006.01); C07D 401/14 (2006.01); B32B 3/02 (2006.01) | ||
| U.S. Cl. 534—702 [544/124; 544/143; 546/8; 546/176; 546/264; 548/402; 548/455; 428/64.4; 428/64.8; 430/270.19; 430/270.2; 430/270.21; 430/945] | 18 Claims |
1. A bisstyryl compound of the formula (I):
![]() wherein Z1 and Z2 are the same or different and are benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 is H, C1-5 alkyl, hydroxyl, halogen, or alkoxy, R2 is H, halogen, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 are H, halogen, substituted or unsubstituted alkyl, aralkyl, or heterocyclic ring containing O, S, or N, W is nitrogen with
or without Z1 and Z2, Y is C—R7R8, oxygen, sulfur, selenium, or —NR—, m is 1˜3, n is 1˜18, and X1 and X2 are the same or different and are an anion or an anionic organometallic complex, wherein R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, R7 and R8 are H or alkyl, and R bonded to nitrogen is C1-5 alkyl.
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