| US 7,597,046 B1 | ||
| Integrated thin film explosive micro-detonator | ||
| Gerald Laib, Olney, Md. (US) | ||
| Assigned to The United States of America as Represented by the Secretary of the Navy, Washington, D.C. (US) | ||
| Filed on Dec. 03, 2003, as Appl. No. 10/729,266. | ||
| Int. Cl. F42B 3/10 (2006.01); C06C 9/00 (2006.01); F42C 19/08 (2006.01); C06C 5/06 (2006.01) | ||
| U.S. Cl. 102—202.5 [102/205; 102/275.11; 149/109.6] | 9 Claims |
| 1. A method of making a thin film explosive detonator, comprising:
forming a substrate layer;
depositing a metal layer of comprising a metal explosive cation in situ on the substrate layer; and
reacting the metal layer comprising said metal explosive cation with a HN3 gas reactant for forming a primary explosive layer,
wherein said primary explosive layer is a detonator layer comprised of an azide-based explosive salt with a predetermined
thickness.
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