| 1. An apparatus for collecting fluid within a wafer cleaning chamber, comprising:
a rotatable annular manifold having a body including an inner surface and a bottom surface, the annular manifold configured
to support a wafer within a region inside the inner surface, the annular manifold including a channel extending through the
body from the inner surface to the bottom surface, the channel defined to be in fluid communication with at least one opening
in the bottom surface; and
a catch basin having a base with at least one drain defined therein, the base having an inner sidewall and an outer sidewall
extending therefrom, the catch basin being disposed under the annular manifold so as to capture fluid dispensed from the at
least one opening of the bottom surface of the annular manifold.
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