| US 7,596,855 B2 | ||
| Method for manufacturing a magnetic head | ||
| Naoto Matono, Saku (Japan) | ||
| Assigned to SAE Magnetics (H.K.) Ltd., Shatin, N.T. (Hong Kong Special Administrative Region of the People's Republic of China, The) | ||
| Filed on Mar. 16, 2004, as Appl. No. 10/802,596. | ||
| Application 10/802596 is a division of application No. 10/175962, filed on Jun. 19, 2002, granted, now 7,525,770. | ||
| Claims priority of application No. 2001-186521 (JP), filed on Jun. 20, 2001. | ||
| Prior Publication US 2004/0174634 A1, Sep. 09, 2004 | ||
| Int. Cl. G11B 5/187 (2006.01); C25D 5/02 (2006.01) | ||
| U.S. Cl. 29—603.18 [29/603.12; 29/603.16; 360/123.39; 205/125; 205/222] | 6 Claims |
| 1. A method of manufacturing a thin film magnetic head comprising:
providing first and second magnetic layers magnetically coupled to each other and having first and second pole tip portions
placed so as to face a recording medium in conjunction with being in contact with a gap layer and being opposed to each other
as sandwiching the gap layer;
providing a thin film coil disposed in a space between the first and second magnetic layers; and
providing a first insulating layer, sandwiched between a second and a third insulating layer, embedding the thin film coil
in the space between the first and second magnetic layers,
wherein the method further comprises:
forming the gap layer with a non-magnetic conductive material over at least the first insulating layer;
forming at least the first pole tip portion on the gap layer by growing a plating film with the gap layer used as an electrode
and wherein the first magnetic layer including the first pole tip portion is formed of the plating film as a single layer;
and
providing a trim structure comprising a portion of the first magnetic layer and a portion of the second magnetic layer in
direct contact with a portion of the gap layer.
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