| US 7,595,861 B2 | ||
| Exposure apparatus and method of manufacturing device | ||
| Atsushi Kawahara, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Feb. 28, 2008, as Appl. No. 12/38,980. | ||
| Claims priority of application No. 2007-056369 (JP), filed on Mar. 06, 2007. | ||
| Prior Publication US 2008/0218708 A1, Sep. 11, 2008 | ||
| Int. Cl. G03B 27/42 (2006.01); G03B 27/52 (2006.01) | ||
| U.S. Cl. 355—53 [355/30] | 12 Claims |
| 1. An exposure apparatus for transferring a pattern to a substrate by exposing the substrate to light via a reticle, the apparatus
comprising:
(a) an inspection unit configured to inspect the reticle;
(b) an exposure unit configured to expose the substrate to light via the reticle inspected by the inspection unit; and
(c) a controller configured to control the inspection unit and the exposure unit,
wherein the controller is configured:
(i) to set a partial region of the reticle,
(ii) to cause the inspection unit to inspect the partial region of the reticle and a region of the reticle that is different
from the partial region, and
(iii) to cause the exposure unit to expose the substrate to light via the partial region, irrespective of a presence and an
absence of an abnormality in the region that is different from the partial region, if the inspection unit finds no abnormality
in the partial region.
|