US 7,593,091 B2
	Imaging or exposure device, in particular for making an electronic microcircuit
Roland Geyl, L'Hay-les-Roses (France)
Assigned to Sagem Defense Securite, Paris (France)
Appl. No. 11/666,073 PCT Filed Oct. 25, 2005, PCT No. PCT/FR2005/002654 § 371(c)(1), (2), (4) Date Apr. 23, 2007, PCT Pub. No. WO2006/045945, PCT Pub. Date May 04, 2006.
Claims priority of application No. 04 11431 (FR), filed on Oct. 27, 2004.
Prior Publication US 2008/0088811 A1, Apr. 17, 2008
Int. Cl. G03B 27/70 (2006.01); G03B 27/54 (2006.01); G03B 27/42 (2006.01); G02B 26/08 (2006.01)

U.S. Cl. 355—52  [355/67; 355/53; 359/224.1]

4 Claims

1. An imaging or exposure device comprising a radiation source (1) emitting radiation (2), a reticle (3) mounted between the radiation source and an optical projection system (4) for shaping the radiation downstream from the reticle (3), the optical projection system (4) comprising a series of mirrors (7, 8, 10, 11) for making an image (5) of the reticle (3), a plurality of mirrors (10, 11) of the optical projection system (4) being deformable mirrors including deformer members (12, 13) connected to a control unit (14), the device being characterized in that the number of deformable mirrors is strictly limited to two, the control unit being associated with an image analyzer (15) to deform one of the deformable mirrors (10) mainly as a function of differences relative to an image quality setpoint, and to deform the other deformable mirror mainly as a function of differences relative to an image distortion setpoint.