US 7,591,641 B2
Mold and process of production thereof
Tatsuya Saito, Ebina (Japan); Aya Imada, Yokohama (Japan); and Tohru Den, Tokyo (Japan)
Assigned to Canon Kabushiki Kaisha, Tokyo (Japan)
Filed on Mar. 06, 2006, as Appl. No. 11/367,343.
Claims priority of application No. 2005-080923 (JP), filed on Mar. 22, 2005.
Prior Publication US 2006/0216413 A1, Sep. 28, 2006
Int. Cl. B29C 59/00 (2006.01); B28B 7/38 (2006.01)
U.S. Cl. 425—385  [427/133] 7 Claims
OG exemplary drawing
 
1. A mold for nano-imprinting with a concavo-convex pattern comprising a surface portion,
wherein the surface portion has the concavo-convex pattern and comprises a shape-memory material, and
wherein the shape-memory material is an NiTi alloy composed of Ni and Ti at a ratio of 52:48 atom %.