CPC H01L 29/78633 (2013.01) [G02F 1/1368 (2013.01); G02F 1/136209 (2013.01); H01L 29/401 (2013.01); H01L 29/41733 (2013.01); H01L 29/42384 (2013.01); H01L 29/45 (2013.01); H01L 29/458 (2013.01); H01L 29/4908 (2013.01)] | 16 Claims |
1. An electrode structure, comprising:
at least one buffer layer disposed on a substrate;
at least one electrode disposed on a surface of the buffer layer away from the substrate, an edge of the electrode comprising at least one extension surface extending from a surface of the electrode away from the substrate, wherein the extension surface is in contact with a surface of the buffer layer contacting the electrode and forms an included angle with the surface of the buffer layer contacting the electrode;
an anti-reflection layer disposed at the edge of the electrode, wherein the anti-reflection layer is configured to surround and cover the edge of the electrode, and the anti-reflection layer extends to be in contact with the buffer layer; and,
an undercut structure formed between an outer surface of the anti-reflection layer away from the electrode and the surface of the buffer layer contacting the electrode;
wherein the anti-reflection layer is configured to cover the extension surface, and an outer surface of the anti-reflection layer away from the extension surface and the surface of the buffer layer contacting the electrode are configured to form the undercut structure; and
wherein the electrode further has a continuous first surface, the first surface further comprises the extension surface and a second surface, the second surface is a surface excluding the extension surface, the anti-reflection layer is configured to cover only the extension surface and not cover the second surface.
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