US 11,756,972 B2
Apparatus for reducing optical cross-talk in image sensors
Chin-Min Lin, Hsinchu County (TW); Ching-Chun Wang, Tainan (TW); Dun-Nian Yaung, Taipei (TW); Chun-Ming Su, Kaohsiung (TW); and Tzu-Hsuan Hsu, Cianjhen District (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Jul. 9, 2021, as Appl. No. 17/371,279.
Application 15/295,703 is a division of application No. 13/692,104, filed on Dec. 3, 2012, granted, now 9,473,753, issued on Oct. 18, 2016.
Application 17/371,279 is a continuation of application No. 16/721,288, filed on Dec. 19, 2019, granted, now 11,069,731.
Application 16/721,288 is a continuation of application No. 15/964,526, filed on Apr. 27, 2018, granted, now 10,522,586, issued on Dec. 31, 2019.
Application 15/964,526 is a continuation of application No. 15/647,968, filed on Jul. 12, 2017, granted, now 9,966,412, issued on May 8, 2018.
Application 15/647,968 is a continuation of application No. 15/295,703, filed on Oct. 17, 2016, granted, now 9,711,562, issued on Jul. 18, 2017.
Application 13/692,104 is a continuation of application No. 11/779,122, filed on Jul. 17, 2007, abandoned.
Prior Publication US 2021/0335871 A1, Oct. 28, 2021
Int. Cl. H01L 27/146 (2006.01); H04N 23/10 (2023.01); H04N 25/13 (2023.01)
CPC H01L 27/14621 (2013.01) [H01L 27/1464 (2013.01); H01L 27/14623 (2013.01); H01L 27/14627 (2013.01); H01L 27/14643 (2013.01); H01L 27/14685 (2013.01); H04N 23/10 (2023.01); H04N 25/134 (2023.01)] 20 Claims
OG exemplary drawing
 
1. A method for forming an image sensor device, the method comprising:
providing a semiconductor substrate;
forming pixels on the semiconductor substrate, wherein each of the pixels includes a light-sensing element;
forming a planarization layer over a first surface of the semiconductor substrate;
forming a color filter layer on the planarization layer;
patterning the color filter layer to form open regions within the color filter layer, wherein at least one of the open regions is disposed between a first portion of the color filter layer and a second portion of the color filter layer, and wherein the at least one of the open regions is above and between a first pixel of the pixels and a second pixel of the pixels; and
forming a black photo-resist layer within the open regions to form a plurality of light-blocking structures, wherein a first light-blocking structure of the plurality of light-blocking structures is disposed in the at least one of the open regions; and
forming micro-lenses on the color filter layer and interfacing the first light-blocking structure.