US 11,756,817 B2
Apparatus and method for processing substrate
Dukhyun Son, Cheonan-si (KR); and Sunghwan Hong, Cheonan-si (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-Do (KR)
Filed by Semes Co., Ltd, Cheonan-si (KR)
Filed on Mar. 6, 2020, as Appl. No. 16/811,133.
Claims priority of application No. 10-2019-0028919 (KR), filed on Mar. 13, 2019.
Prior Publication US 2020/0294830 A1, Sep. 17, 2020
Int. Cl. H01L 21/673 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/677 (2006.01)
CPC H01L 21/67389 (2013.01) [H01J 37/3244 (2013.01); H01L 21/6719 (2013.01); H01L 21/67383 (2013.01); H01L 21/67742 (2013.01); H01L 21/67766 (2013.01); H01L 21/67769 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An apparatus for processing a substrate, the apparatus comprising:
an index module; and
a processing module adjacent to the index module and configured to process the substrate,
wherein the index module includes:
one or more load ports, configured to have placed on each of which a carrier having the substrate received therein;
a side storage configured to store the substrate subjected to a process in the processing module and to remove fumes on the substrate; and
a transfer frame having an index robot installed therein, the index robot being configured to transfer the substrate between the carrier placed on the load port, the side storage, and the processing module,
wherein the side storage includes:
a housing having an interior space;
a partitioning unit including an adjustable partitioning plate, the partitioning unit configured to partition the interior space into a plurality of receiving spaces independent of one another; and
an exhaust unit configured to independently and separately evacuate the plurality of receiving spaces.