US 11,756,768 B2
High-frequency power supply system
Yuichi Hasegawa, Osaka (JP); and Yuya Ueno, Osaka (JP)
Assigned to DAIHEN CORPORATION, Osaka (JP)
Filed by DAIHEN CORPORATION, Osaka (JP)
Filed on Dec. 17, 2021, as Appl. No. 17/554,609.
Claims priority of application No. 2020-217562 (JP), filed on Dec. 25, 2020.
Prior Publication US 2022/0208519 A1, Jun. 30, 2022
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32155 (2013.01) [H01J 37/32183 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A high-frequency power supply system for providing a high-frequency power to a connected load, the high-frequency power supply system comprising:
a bias power supply for supplying a bias power at a first frequency;
a source power supply for supplying a high-frequency output of a second frequency higher than the first frequency, the high-frequency output being frequency modulated with the first frequency; and
a matching device including an impedance matching circuit for acquiring the bias power and the frequency modulated high-frequency output and achieving matching between an impedance on the source power supply side and an impedance on the load side,
wherein the source power supply, in response to a trigger signal for timing having the same frequency as the first frequency, detects a reflected wave while causing each of a modulation start phase and a modulation amount gain to be varied, and determines an optimum modulation start phase and an optimum modulation amount gain that minimize the reflected wave.